Schottky device and method of manufacture

ABSTRACT

A Schottky device includes a plurality of mesa structures where one or more of the mesa structures includes a doped region having a multi-concentration dopant profile. In accordance with an embodiment, the Schottky device is formed from a semiconductor material of a first conductivity type. Trenches having sidewalls and floors are formed in the semiconductor material to form a plurality of mesa structures. A doped region having a multi-concentration impurity profile is formed in at least one trench, where the impurity materials of the doped region having the multi-concentration impurity profile are of a second conductivity type. A Schottky contact is formed to at least one of the mesa structures having the dope region with the multi-concentration impurity profile.

The present application is a divisional application of U.S. patent application Ser. No. 14/160,273 filed on Jan. 21, 2014, by Mohammed Tanvir Quddus et al., titled “SCHOTTKY DEVICE AND METHOD OF MANUFACTURE” which is a nonprovisional patent application of provisional patent application No. 61/881,952 filed on Sep. 23, 2013, by Mohammed Tanvir Quddus et al. titled “TRENCH BASED SCHOTTKY RECTIFIER AND METHOD”, which is hereby incorporated by reference in its entirety and priority thereto for common subject matter is hereby claimed.

TECHNICAL FIELD

The present invention relates, in general, to semiconductor components and, more particularly, to semiconductor components that include Schottky devices.

BACKGROUND

Semiconductor components such as a Schottky device are well suited for use in high frequency applications because they have short reverse recovery times and low forward voltages, i.e., low losses. Techniques for increasing the breakdown voltage of a Schottky device have resulted in an increase in its forward voltage and a decrease in its switching speed. Since the forward voltage drop of a Schottky device increases significantly in devices configured to support an increased breakdown voltage, Schottky devices may be limited to applications of less than 300 volts. Power rectifiers that improve the forward voltage drop, reverse leakage current, and switching speed of Schottky contact regions have been described in U.S. Pat. No. 4,982,260 issued to Hsueh-Rong Chang on Jan. 1, 1991. Trench-gated Schottky devices for protecting gate oxide from high electric fields and hot carrier generation have been described in U.S. Pat. No. 6,078,090 issued to Richard K. Williams on Jun. 20, 2000. A drawback with these techniques is that they increase the amount of silicon used to manufacture the Schottky devices, which increases cost. Other drawbacks with Schottky devices are that they have low reverse blocking capabilities, high current leakage characteristics, and high forward voltage drops.

Accordingly, it would be advantageous to have Schottky devices that offer fast switching and soft recovery characteristics with a high voltage blocking capability, a low leakage current, and a low forward voltage drop. It would be of further advantage for the method of manufacturing the Schottky devices to be cost efficient, time efficient, and compatible with Schottky device manufacturing processes.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will be better understood from a reading of the following detailed description, taken in conjunction with the accompanying drawing figures, in which like reference characters designate like elements and in which:

FIG. 1 is a cross-sectional view of a semiconductor component at an early stage of manufacture in accordance with an embodiment of the present invention;

FIG. 2 is a cross-sectional view of the semiconductor component of FIG. 1 at a later stage of manufacture;

FIG. 3 is a cross-sectional view of the semiconductor component of FIG. 2 at a later stage of manufacture;

FIG. 4 is a cross-sectional view of the semiconductor component of FIG. 3 at a later stage of manufacture;

FIG. 5 is a cross-sectional view of the semiconductor component of FIG. 4 at a later stage of manufacture;

FIG. 6 is a cross-sectional view of the semiconductor component of FIG. 5 at a later stage of manufacture;

FIG. 7 is a cross-sectional view of the semiconductor component of FIG. 6 at a later stage of manufacture;

FIG. 8 is a cross-sectional view of the semiconductor component of FIG. 7 at a later stage of manufacture;

FIG. 9 is a cross-sectional view of the semiconductor component of FIG. 8 at a later stage of manufacture;

FIG. 10 is an impurity profile in accordance with and embodiment of the present invention;

FIG. 11 is a plot of current versus time for a semiconductor component configured in accordance with an embodiment of the present invention;

FIG. 12 is a plot of breakdown voltage versus forward voltage for a semiconductor configured in accordance with an embodiment of the present invention;

FIG. 13 is a cross-sectional view of a semiconductor component during manufacture in accordance with another embodiment of the present invention;

FIG. 14 is a cross-sectional view of a semiconductor component during manufacture in accordance with another embodiment of the present invention;

FIG. 15 is a cross-sectional view of a semiconductor component during manufacture in accordance with another embodiment of the present invention;

FIG. 16 is a layout of a semiconductor component manufactured in accordance with another embodiment of the present invention;

FIG. 17 is a cross-sectional view of the semiconductor component of FIG. 16 taken along section line 17-17 in accordance with an embodiment of the present invention;

FIG. 18 is a layout of a semiconductor component manufactured in accordance with another embodiment of the present invention;

FIG. 19 is a cross-sectional view of the semiconductor component of FIG. 18 taken along section line 19-19 in accordance with an embodiment of the present invention;

FIG. 20 is a top view of a frequency of a number of multi-concentration doped regions in accordance with another embodiment of the present invention;

FIG. 21 is a top view of a frequency of a number of multi-concentration doped regions in accordance with another embodiment of the present invention; and

FIG. 22 is a cross-sectional view of a Schottky device in accordance with another embodiment of the present invention.

For simplicity and clarity of illustration, elements in the figures are not necessarily to scale, and the same reference characters in different figures denote the same elements. Additionally, descriptions and details of well-known steps and elements are omitted for simplicity of the description. As used herein current carrying electrode means an element of a device that carries current through the device such as a source or a drain of an MOS transistor or an emitter or a collector of a bipolar transistor or a cathode or anode of a diode, and a control electrode means an element of the device that controls current flow through the device such as a gate of an MOS transistor or a base of a bipolar transistor. Although the devices are explained herein as certain n-channel or p-channel devices, or certain n-type or p-type doped regions, a person of ordinary skill in the art will appreciate that complementary devices are also possible in accordance with embodiments of the present invention. It will be appreciated by those skilled in the art that the words during, while, and when as used herein are not exact terms that mean an action takes place instantly upon an initiating action but that there may be some small but reasonable delay, such as a propagation delay, between the reaction that is initiated by the initial action. The use of the words approximately, about, or substantially means that a value of an element has a parameter that is expected to be very close to a stated value or position. However, as is well known in the art there are always minor variances that prevent the values or positions from being exactly as stated. It is well established in the art that variances of up to about ten percent (10%) (and up to twenty percent (20%) for semiconductor doping concentrations) are regarded as reasonable variances from the ideal goal of exactly as described.

DETAILED DESCRIPTION

Generally the present invention provides a Schottky device and a method for manufacturing the Schottky device that includes manufacturing mesa structures or mesa regions having stepped or multi-concentration impurity profiles. In accordance with an aspect, the Schottky device comprises a semiconductor material of a first conductivity type comprising a plurality of trenches that extend into portions of the semiconductor material, wherein each trench of the plurality of trenches has sidewalls and a floor. A portion of the semiconductor material between two trenches serves as a mesa structure and has a multi-concentration impurity profile, wherein impurity materials of the multi-concentration impurity profile are of a second conductivity type. In alternative embodiments the impurity material may be formed in one or more sets of two adjacent trenches that are adjacent to each other or spaced apart by other trenches. In accordance with an embodiment, the first conductivity type is N-type conductivity and the second conductivity type is P-type conductivity. In accordance with another embodiment, the first conductivity type is P-type conductivity and the second conductivity type is N-type conductivity.

In accordance with another aspect, a Schottky device is provided that comprises a semiconductor material of a first conductivity type having first and second major surfaces. A plurality of trenches extend from the first major surface into the semiconductor material, wherein the plurality of trenches comprises at least first, second, and third trenches, wherein a first portion of the semiconductor material is between the first and second trenches, and a second portion of the semiconductor material is between the second and third trenches. The Schottky device includes conductivity modulation means that modulates conductivity in the first portion of the semiconductor material.

In accordance with another aspect, a method for manufacturing a Schottky device comprises providing a semiconductor material of a first conductivity type having first and second major surfaces and forming a first mesa structure from a first portion of the semiconductor material. A first doped region of a second conductivity type and a first impurity material concentration is formed in a first sub-portion of the first mesa structure, wherein the first doped region extends from the first major surface a first distance into the first mesa structure. A second doped region of the second conductivity type and a second impurity material concentration is formed in a second sub-portion of the first mesa structure and a Schottky contact is formed that contacts the first mesa structure.

FIG. 1 is a cross-sectional view of a portion of a semiconductor component 10 such as for example, a Schottky device, during manufacture in accordance with an embodiment of the present invention. What is shown in FIG. 1 is a semiconductor material 12 having opposing surfaces 14 and 16. Surface 14 is also referred to as a front or top surface and surface 16 is also referred to as a bottom or back surface. In accordance with this embodiment, semiconductor material 12 comprises an epitaxial layer 20 formed on a semiconductor substrate 18. Preferably, substrate 18 is silicon heavily doped with an N-type dopant or impurity material and epitaxial layer 20 is silicon lightly doped with an N-type dopant. In accordance with embodiments of the present invention, substrate 18 has a resistivity of less than about 6 milliOhm-centimeters (mΩ-cm) and epitaxial layer 20 has a thickness ranging about 8 micrometers (μm) to about 20 μm and a resistivity ranging from about 4 Ω-cm to about 12 Ω-cm. By way of example, substrate 18 has a resistivity of about 5.4 mΩ-cm, epitaxial layer 20 has a resistivity of about 5.9 Ω-cm and a thickness of about 13.5 μm. Substrate layer 18 provides a low resistance conduction path for current to flow in a Schottky device. It should be noted that a region or layer doped with an N-type dopant is said to be of an N-type conductivity or an N conductivity type and a region or layer doped with a P-type dopant is said to be of a P-type conductivity or a P conductivity type. Suitable N-type dopants include arsenic, antimony, phosphorus, or the like and suitable P-type dopants include boron, indium, or the like.

It should be appreciated that semiconductor material 12 includes an active region 17 and an edge termination region 19. An edge termination structure 21 may be formed in edge termination region 19. It should be noted that edge termination structure 21 has been included in block form for the sake of completeness and that additional processing steps may be performed to complete the formation of edge termination structure 21.

Still referring to FIG. 1, surface 14 is cleaned using, for example, a wet hydrofluoric (HF) acid etching process, then a layer of dielectric material 22 is formed on or from epitaxial layer 20. In accordance with an embodiment, the material of dielectric layer 22 is silicon dioxide having a thickness ranging from about 100 Angstroms (Å) to about 5,000 Å. By way of example, dielectric layer 22 is silicon dioxide formed using a dry oxidation process or a steam oxidation process at a temperature ranging from about 750 degrees Celsius (° C.) to about 1,050° C. An exemplary temperature for forming dielectric layer is 900° C. Dielectric layer 22 may be formed by oxidation techniques, deposition techniques, etc. Other suitable materials for dielectric layer 22 include silicon nitride or the like.

A layer of photoresist is patterned over dielectric layer 22 to form a masking structure 24 having masking elements 26 and openings 28 that expose portions of dielectric layer 22. Masking structure 24 is also referred to as a mask, a screen mask, or an implant mask. Doped regions 32A, 32B, 32C, 32D, 32E, 32F, and 32G of, for example, P-type conductivity may be formed in epitaxial layer 20 by implanting an impurity material such as boron or indium through openings 28, the exposed portions of dielectric layer 22, and into epitaxial layer 20. In accordance with embodiments in which the impurity material is boron, the boron may be implanted at a dose ranging from about 1×10¹² ions per centimeter squared (ions/cm²) to about 1×10¹⁴ ions/cm² and an implant energy ranging from about 50 kilo electron volts (keV) to about 450 keV. By way of example, the implant dose is about 8×10¹² ions/cm² and the implant energy is about 300 keV. Masking structure 24 is removed. The implant may be activated and diffused using a Rapid Thermal Anneal (RTA) performed in, for example, a nitrogen ambient at a temperature ranging from about 850° C. to about 1,100° C. for a time ranging from 30 seconds to about 2 minutes. For the sake of clarity, doped regions 32A, 32B, 32C, 32D, 32E, 32F, and 32G may be referred to as doped regions 32A-32G. It should be noted the technique for forming doped regions 32A-32G is not limited to an implantation technique. Alternatively, doped regions 32A-32G may be formed by deposition and diffusion techniques.

Referring now to FIG. 2, a layer of photoresist is patterned over dielectric layer 22 to form a masking structure 36 having masking elements 38 and openings 40 that expose portions of dielectric layer 22. Masking structure 36 is also referred to as a mask or an etch mask.

Referring now to FIG. 3, trenches 50A, 50B, 50C, 50D, 50E, 50F, 50G, 50H, 50I, 50J, 50K, 50L, 50M, and 50N are formed in epitaxial layer 20 by removing portions of dielectric layer 22 and portions of epitaxial layer 20 exposed by the removal of the portions of dielectric layer 22. For the sake of clarity, trenches 50A, 50B, 50C, 50D, 50E, 50F, 50G, 50H, 50I, 50J, 50K, 50L, 50M, and 50N may be referred to as trenches 50A-50N. More particularly, the exposed portions of dielectric layer 22 and the portions of epitaxial layer 20 that are below the exposed portions of dielectric layer 22 are removed. Dielectric layer 22 that has removed portions, i.e., the remaining portions of dielectric layer 22 may be referred to as a hardmask. Trench 50A has sidewalls 50A_(S) and a floor 50A_(F), trench 50B has sidewalls SOB_(S) and a floor 50B_(F), trench 50C has sidewalls 50C_(S) and a floor 50C_(F), trench 50D has sidewalls SOD_(S) and a floor 50D_(F), trench 50E has sidewalls 50E_(S) and a floor 50E_(F), trench 50F has sidewalls 50F_(S) and a floor 50F_(F), trench 50G has sidewalls 50G_(S) and a floor 50G_(F), trench 50H has sidewalls 50H_(S) and a floor 50H_(F), trench 50I has sidewalls 50I_(S) and a floor 50I_(F), trench 50J has sidewalls 50J_(S) and a floor 50J_(F), trench 50K has sidewalls 50K_(S) and a floor 50K_(F), trench 50L has sidewalls 50L_(S) and a floor 50L_(F), trench 50M has sidewalls 50M_(S) and a floor 50M_(F), and trench 50N has sidewalls 50N_(S) and a floor 50N_(F). By way of example, trenches 50A-50N may be formed using Reactive Ion Etching (RIE) etching with a fluorine and oxygen based chemistry, wherein the fluorine to oxygen ratio may be used to control the trench profile parameters such as the anisotropy of the trenches and the uniformity of the trench depth. Trenches 50A-50N may be etched to have a depth, D, ranging from about 0.7 μm to about 5 μm, a trench width, W, ranging from about 0.2 μm to about 3 μm, and a center-to-center spacing, S, ranging from about 0.75 μm to about 5 μm. By way of example, the trenches 50A-50N have a depth, D, of about 2.2 μm, a width, W, of about 0.8 μm, a center-to-center spacing, S, of about 2.5 μm.

Although trenches with vertical sidewalls are preferred, this is not a limitation of the present invention. Alternatively trenches 50A-50N may have tapered profiles where the widths of trenches 50A-50N at their trench floors may be less than their widths near surface 14. In embodiments in which the trench sidewalls are substantially vertical and the trench floors are substantially parallel to surface 14, the sidewalls serve as vertical surfaces and the floors serve as horizontal surfaces. Trenches 50A-50N are shown as ending in epitaxial layer 20, however, this is not a limitation of the present invention. For example, trenches 50A-50N may end at substrate 18 or they may extend into substrate 18. In addition, the depths of trenches 50A-50N may be selected so that doped regions 32A, 32B, 32C, 32D, 32E, 32F, and 32G extend a distance into epitaxial layer 20 from surface 14 that is at least 40 percent (%) of the trench depth. The etching technique and the number of trenches 50A-50N formed in epitaxial layer 20 are not limitations of the present invention.

Formation of trenches 50A-50N, leaves mesa structures 33A, 33B, 33C, 33D, 33E, 33F, 33G, 35A, 35B, 35C, 35D, 35E, and 35F that are formed from portions of semiconductor material 12. For the sake of clarity, mesa structures 33A, 33B, 33C, 33D, 33E, 33F, and 33G may be referred to as mesa structures 33A-33G and mesa structures 35A, 35B, 35C, 35D, 35E, and 35F may be referred to as mesa structures 35A-35F. Mesa structure 33A is between and laterally bounded by trenches 50A and 50B; mesa structure 33B is between and laterally bounded by trenches 50C and 50D; mesa structure 33C is between and laterally bounded by trenches 50E and 50F; mesa structure 33D is between and laterally bounded by trenches 50G and 50H; mesa structure 33E is between and laterally bounded by trenches 50I and 50J; mesa structure 33F is between and laterally bounded by trenches 50K and 50L, mesa structure 33G is between and laterally bounded by trenches 50M and 50N. Mesa structure 35A is between and laterally bounded by trenches 50B and 50C; mesa structure 35B is between an laterally bounded by trenches 50D and 50E; mesa structure 35C is between and laterally bounded by trenches 50F and 50G; mesa structure 35D is between and laterally bounded by trenches 50H and 50I; mesa structure 35E is between and laterally bounded by trenches 50J and 50K; and mesa structure 35F is between and laterally bounded by trenches 50L and 50M.

It should be noted that doped region 32A is in mesa structure 33A, doped region 32B is in mesa structure 33B, doped region 32C is in mesa structure 33C, doped region 32D is in mesa structure 33D, doped region 32E is in mesa structure 33E, doped region 32F is in mesa structure 33F, and doped region 32G is in mesa structure 33G.

Referring now to FIG. 4, the remaining portions of dielectric layer 22 are removed to expose surface 14, sidewalls 50A_(S)-50N_(S), and floors 50A_(F)-50N_(F), which are then cleaned using a wet HF etching technique to remove any native oxide that may be present. A dielectric layer 54 is formed on the sidewalls surface 14, 50A_(S)-50N_(S), and floors 50A_(F)-50N_(F). By way of example, dielectric layer 54 is formed by a wet oxidation technique at a temperature ranging from about 1,000° C. to about 1,400° C. and has a thickness ranging from about 1,000 Å to about 5,000 Å.

Referring now to FIG. 5, a layer of semiconductor material 60 is formed on the dielectric layer 54. In accordance with an embodiment, the material of semiconductor layer 60 is polysilicon doped with an N-type impurity material having a dopant concentration ranging from about 1×10¹⁸ atoms/cm³ to about 1×10²⁹ atoms/cm³. By way of example, semiconductor layer 60 is doped with phosphorus having a dopant concentration of about 1×10¹⁹ atoms/cm³. It should be noted that the dopant or impurity material concentration of polysilicon layer 60 is not a limitation of the present invention.

Referring now to FIG. 6, polysilicon layer 60 and dielectric layer 54 are etched back using, for example, a plasma ion etcher with a fluorine chemistry. Etching dielectric layer 54 leaves a dielectric layer 54A on sidewalls 50A_(S) and floor 50A_(F); a dielectric layer 54B is formed on sidewalls 50B_(S) and floor 50B_(F); a dielectric layer 54C is formed on sidewalls 50C_(S) and floor 50C_(F); a dielectric layer 54D is formed on sidewalls 50D_(S) and floor 50D_(F); a dielectric layer 54E is formed on sidewalls 50E_(S) and floor 50E_(F); a dielectric layer 54F is formed on sidewalls 50F_(S) and floor 50F_(F); a dielectric layer 54G is formed on sidewalls 50G_(S) and floor 50G_(F); a dielectric layer 54H is formed on sidewalls 50H_(S) and floor 50H_(F); a dielectric layer 54I is formed on sidewalls 50I_(S) and floor 50I_(F); a dielectric layer 54J is formed on sidewalls 50J₅ and floor 50J_(F); a dielectric layer 54K is formed on sidewalls 50K_(S) and floor 50K_(F); a dielectric layer 54L is formed on sidewalls 50L_(S) and floor 50L_(F), a dielectric layer 54M is formed on sidewalls 50M_(S) and floor 50M_(F), and a dielectric layer 54N is formed on sidewalls 50Ns and floor 50N_(F). For the sake of clarity, dielectric layers 54A, 54B, 54C, 54D, 54E, 54F, 54G, 54H, 54I, 54J, 54K, 54L, 54M, and 54N may be referred to as dielectric layers 54A-54N.

Etching back polysilicon layer 60 leaves portions 64A, 64B, 64C, 64D, 64E, 64F, 64G, 64H, 64I, 64J, 64K, 64L, 64M, and 64N on dielectric layers 54A-54N in trenches 50A-50N, respectively. Portions 64A, 64B, 64C, 64D, 64E, 64F, 64G, 64H, 64I, 64J, 64K, 64L, 64M, and 64N may be referred to as polysilicon fill material, polysilicon plugs, or the like. It should be noted that polysilicon remaining in trenches 50A-50N may partially fill trenches 50A-50N or fully fill trenches 50A-50N. It should be further noted that an optional planarization step may be performed to planarize the surface 14 and the exposed portions of polysilicon fill material 64A-64N and the exposed portions of dielectric layers 54A-54N. By way of example, the optional planarization step includes the use of an ion plasma tool with fluorine, chlorine, and oxygen chemistries. A layer of dielectric material 69 having a thickness ranging from about 1,000 Å to about 4,000 Å is formed on the exposed portions of surface 14 of epitaxial layer 20, the exposed portions of mesa structures 33A-33G, the exposed portions of mesa structures 35A-35F, the exposed portions of polysilicon fill material 64A-64N, and the exposed portions of dielectric layers 54A-54N. Dielectric layer 69 may be an oxide grown using a dry oxidation process or a steam oxidation process. In accordance with embodiments in which dielectric layer 69 is oxide, it may be referred to as screen oxide.

Referring now to FIG. 7, a layer of photoresist is patterned over screen oxide layer 69 to form a masking structure 70 having masking elements 72 and openings 74 that expose the portions of screen oxide layer 69 over doped regions 32A-32G in mesa structures 33A-33G, respectively. Masking structure 70 is also referred to as a mask, a screen mask, or an implant protect mask. Doped regions 32A-32G may be doped with an impurity material of P-type conductivity by, for example, implanting an impurity material such as boron through openings 74 to form enhanced doped regions 82A, 82B, 82C, 82D, 82E, 82F, and 82G in portions of doped regions 32A, 32B, 32C, 32D, 32E, 32F, and 32G, respectively. Boron may be implanted at a dose ranging from about 1×10¹² ions per centimeter squared (ions/cm²) to about 1×10¹⁴ ions/cm², an implant energy ranging from about 50 kilo electron volts (keV) to about 300 keV, and an implant angle ranging from about 0 degrees to about 45 degrees. By way of example, the implant dose is about 1.5×10¹³ ions/cm², the implant energy is about 100 keV, and the implant angle is about 7 degrees. For the sake of clarity, enhanced doped regions 82A, 82B, 82C, 82D, 82E, 82F, and 82G may be referred to as enhanced doped regions 82A-82G. Thus, in accordance with an embodiment, doped regions 32A-32G are formed in mesa structures mesa structures 33A-33G, respectively, and doped regions 82A-82G are formed within doped regions 32A-32G and mesa structures 33A-33G, respectively, for example, doped regions 32A-32G are formed within sub-portions of mesa structures 33A-33G and doped regions 82A-82G are formed within sub-portions of mesa structures 33A-33G. Doped regions 32A-32G extend from surface 14 into semiconductor material 12 a distance that is greater than the distance that doped regions 82A-82G extend into semiconductor material 12, i.e., doped regions 82A-82G extend from surface 14 into semiconductor material 12 a distance that is less than the distance that doped regions 32A-32G extend into semiconductor material 12. Thus, doped regions 32A-32G and 82A-82G are formed in mesa structures 33A-33G, respectively, such that mesa structures 33A-33G have multi-concentration impurity profiles. The multi-concentration impurity profiles may be referred to as a multi-concentration impurity material profiles. In an embodiment, doped regions 82A-82G are formed within the sub-portions of mesa structures 33A-33G in which doped regions 32A-32G are formed, respectively. In accordance with another embodiment, the multi-concentration impurity profiles are stepped dopant profiles. It should be noted that some of doped regions 32A-32G can be formed using, for example an implant technique and other doped regions of doped regions 32A-32G can be formed using a diffusion technique. Likewise, some of doped regions 82A-82G can be formed using, for example an implant technique and other doped regions of doped regions 82A-82G can be formed using a diffusion technique. Alternatively, the dopant concentrations of doped regions 32A-32G may be the same or different from one another and the dopant concentrations of doped regions 82A-82G may be the same or different from one another.

Masking structure 70 is removed and the implant may be activated and diffused using an RTA step performed in, for example, a nitrogen ambient at a temperature ranging from about 850° C. to about 1,100° C. for a time ranging from 30 seconds to about 2 minutes. In accordance with an embodiment, the anneal temperature may be about 1,000° C. and the anneal time may be about 45 seconds. The technique for forming doped regions 82A-82G is not limited to an implantation technique. Alternatively, doped regions 82A-82G may be formed by deposition and diffusion techniques. Although enhanced doped regions are described as being formed after the formation of trenches 50A-50N, this is not a limitation of the present invention. For example, enhanced doped regions 82A-82G may be formed before the formation of trenches 50A-50N or before or after formation of doped regions 32A-32G.

Referring now to FIG. 8, screen oxide layer 69 is removed to expose surface 14 and the exposed portions of polysilicon fill material 64A-64N, and the exposed portions of dielectric layers 54A-54N, which are cleaned using a wet HF etching technique to remove any native oxide that may be present.

Referring now to FIG. 9, a barrier metal deposition process is performed in which a barrier metal is deposited on dielectric layers MA-MN, polysilicon fill material 64A-64N, enhanced doped regions 82A-82G, and portions of surface 14. In accordance with an embodiment, the barrier metal includes a nickel platinum metal alloy having a thickness ranging from about 100 Å to about 2,000 Å. By way of example, the nickel platinum metal alloy has a thickness of about 700 Å. The nickel platinum metal alloy is treated to a rapid thermal anneal in a nitrogen ambient at a temperature ranging from about 300° C. to about 700° C. for a time ranging from about 15 seconds to about 120 seconds. The heat treatment causes the nickel platinum metal alloy to react with the silicon to form nickel platinum silicide in all regions in which the nickel platinum metal alloy is in contact with silicon or polysilicon. Thus, nickel platinum silicide layers 88 are formed from polysilicon fill material 50A-50N, nickel platinum silicide layers 90 are formed from doped regions 82A-82G, and nickel platinum silicide layers 92 are formed from the exposed portions of surface 14. The unreacted nickel platinum metal alloy is removed using for example a hot SPM strip. The hot SPM strip solution may be comprised of sulfuric acid and hydrogen peroxide. It should be noted that the barrier metal is not limited to nickel platinum alloys. Other suitable materials for the barrier metal layers include titanium nitride, titanium, tungsten, platinum, aluminum copper, or the like. In addition, the number of metal layers forming the barrier metal is not limited to a single metal layer, but may be comprised of one, two, three, or more metal layers.

A metal layer 94 is formed in contact with the barrier metal layer or layers. Suitable materials for metal layer 94 include aluminum, nickel, silver, or the like. Silicide layers 88, 90, and 92, the barrier metal layers, and metal layer 94 form an anode or anode contact 96 of Schottky device 10 and also may be referred to as a Schottky metallization system or a Schottky contact. Thus, a Schottky contact is formed to at least one of mesa structures 33A-33G. A conductor 98 is formed in contact with surface 16 and serves as a cathode or cathode contact for Schottky device 10 and may be referred to as a cathode metallization system. Suitable metallization systems for conductor 98 include a gold alloy, titanium-nickel-gold, titanium-nickel-silver, or the like. It should be noted that the metal of the portions of the metallization system in contact with mesa structures that include multi-concentration dopant profiles, i.e., mesa structures 33A-33G may be different than the metal of the portions of the metallization system that contact mesa structures in which the multi-concentration dopant profiles are absent, e.g., mesa structures 35A-35F. Thus, silicide layers 88 in combination with portions of metal layer 94 form ohmic contact portions to the electrically conductive material 64A-64N in trenches 50A-50N, respectively, where electrically conductive material 64A-64N may be polysilicon fill material; silicide layers 90 in combination with portions of metal layer 94 form contacts to sets of doped regions 32A/82A to 32G/82G that are between an ohmic contact and conventional Schottky contacts; and silicide layers 92 in combination with portions of metal layer 94 form conventional Schottky contacts to mesa structures 35A-35G. It should be noted that a contact formed by a barrier metal such as metal 92 and a lightly doped epitaxial layer, e.g., a dopant concentration of about 10¹⁵ cm³, forms a conventional Schottky contact and a contact formed by a metal such as metal 88 and a highly doped semiconductor material, e.g., a dopant concentration of about 10¹⁹ cm³, such as N-type semiconductor material 64 forms a conventional Ohmic contact.

FIG. 10 illustrates dopant profiles of impurity material in regions of semiconductor material 12 between adjacent trenches. More particularly, the dopant profiles are an example of an embodiment of the dopant concentration in doped regions such as doped regions 32A-32G and 82A-82G versus dopant depth or distance from surface 14 into semiconductor material 12. In accordance with embodiments of the present invention, the concentration of P-type impurity materials, i.e., the dopant concentration, at or near surface 14 has been increased such that a surface concentration of the P-type impurity materials or P-type dopants is about 5.5×10¹⁷ atoms/cm³. It should be noted that surface 14 is indicated as being at a depth of zero micrometers. For the sake of illustration, reference character 152 illustrates the surface concentration of P-type impurity materials after formation of doped regions 32A-32G. Reference character 154 illustrates the surface concentration of P-type impurity materials after the formation of enhanced doped regions 82A-82G. Reference character 156 illustrates the concentration of P-type impurity material at the depth at which enhanced doped regions 82A-82G end and reference character 158 illustrates the depth at which doped regions 32A-32G end, i.e., the P-N junction formed between doped regions 32A-32G and semiconductor material 12. The impurity material concentration between the depths indicated by reference characters 158 and 160 represent the impurity material concentration of epitaxial layer 20 and the impurity material concentration indicated by the depths to the right of reference character 160 indicate the impurity material concentration of semiconductor substrate 18. It should be noted that the impurity material concentrations of epitaxial layer 20 is substantially constant and the impurity material concentration of semiconductor substrate 18 is substantially constant, wherein the impurity material concentration of substrate 18 is greater than that of epitaxial layer 20.

FIG. 11 is a switching performance plot 200 illustrating the switching current versus time for Schottky devices in accordance with embodiments of the present invention. What is shown in FIG. 11 is the switching characteristics of a Schottky device that is switched off to a reverse voltage, VR, of 30 volts, a forward current, IF, of 1 Amp, and current change, di/dt, of 100 Amps per microsecond. Trace 202 indicates the switching performance of a typical Schottky device. It should be noted that the current decreases to about −1.5 Amps at about 26 nanoseconds. Traces 204 and 205 indicate that the current decreases to about −1 Amp at about 25 nanoseconds. From these plots it can be determined that increasing the concentration of impurity material in the mesa structures improves the forward voltage drop, VF, of a Schottky device, while leaving the reverse recovery charge substantially unaffected. Those skilled in the art would not expect that increasing the concentration of impurity material in the mesa structures would reduce the forward voltage VF of the Schottky device at a cost of increasing the switching speed. However, traces 204 and 205 demonstrate that the reduction in the forward voltage VF by increasing the concentration of the impurity material in accordance with embodiments of the present invention produces the unexpected result of insignificantly affecting the switching speed. It should be noted that trace 205 may substantially overlap trench 204 such that they appear as a single trace.

FIG. 12 is a plot 210 of breakdown voltage versus the forward voltage for Schottky devices manufactured in accordance with embodiments of the present invention. Trace 212 illustrates the breakdown voltage versus the forward voltage for Schottky devices manufactured in accordance with embodiments of the present invention. Trace 214 indicates the breakdown voltage versus the forward voltage for Schottky devices in which the mesa structures have received a single doping with impurity materials. Trace 216 illustrates the breakdown voltage versus the forward voltage for prior art Schottky devices. Plot 210 illustrates that the breakdown voltage of a Schottky device at a particular forward voltage is greater for Schottky devices manufactured in accordance with embodiments of the present invention.

FIG. 13 is a cross-sectional view of a semiconductor component 250 in accordance with another embodiment of the present invention. What is shown in FIG. 13 is an embodiment in which doped regions 32A-32G extend further into epitaxial layer 20 than trenches 50A-50N extend into epitaxial layer 20.

FIG. 14 is a cross-sectional view of a semiconductor component 260 in accordance with another embodiment of the present invention. What is shown in FIG. 14 is an embodiment in which a frequency of the occurrence of doped regions formed between trenches is decreased. More particularly, FIG. 14 illustrates the formation of doped regions 32A and 32G and enhanced doped regions 82A and 82F. Forming enhanced doped regions in selected mesa regions allows injection of minority carriers at a sufficiently high forward voltage and modulation of the conductivity of doped regions 32A-32G, thereby reducing the on-resistance of epitaxial layer 20 and providing a low forward voltage in the forward operating mode. The amount of conductivity modulation may be controlled by controlling the concentration of the enhanced doped regions and the number of mesa regions in which enhanced doped regions are formed, wherein using a higher concentration, a higher number of mesa regions having the enhanced doped regions, or using both a higher concentration and a higher number of mesa regions having the enhanced doped regions allows a higher conductivity modulation.

FIG. 15 is a cross-sectional view of a semiconductor component 270 in accordance with another embodiment of the present invention. What is shown in FIG. 15 is an embodiment in which a frequency of the occurrence of doped regions formed between trenches is decreased. More particularly, FIG. 15 illustrates the formation of doped regions 32A and 32G and enhanced regions 82A and 82G in which doped regions 32A and 32G extend further into epitaxial layer 20 than trenches 50A, 50B, 50M, and 50N extend into epitaxial layer 20.

FIG. 16 is a layout of a semiconductor component 280 manufactured in accordance with another embodiment of the present invention. Semiconductor component 280 is comprised of a plurality of trenches 50 and mesa structures 33, where a mesa structure 33 is formed between adjacent trenches 50, and where a multi-concentration doping profile is included in every seventh mesa structure 33. FIG. 17 is a cross-sectional view along section line 17-17 of FIG. 16 illustrating the formation of a multi-concentration doping profile in mesa structures 33A and 33H. It should be noted that the number and spacing of the multi-concentration doped regions is not a limitation of the present invention. For example, the multi-concentration profiles may be formed in every other mesa structure, every third mesa structure, every fourth mesa structure, every fifth mesa structure, every sixth mesa structure, every eighth mesa structure, etc. That is the multi-concentration doped regions may be formed in every nth mesa structure, where “n” is an integer. Alternatively, multi-concentration doped regions may be formed in “n” adjacent mesa structure and absent in one or more mesa structures adjacent the “n” adjacent mesa structures; or multi-concentration doped regions may be formed in “n” adjacent mesa structures, absent in one or more mesa structures adjacent the “n” adjacent mesa structures and formed another “n” adjacent mesa structures, i.e., the one or more adjacent mesa structures without multi-concentration doped regions may be between two sets of “n” adjacent mesa structures having multi-concentration doped regions.

FIG. 18 is a layout of a semiconductor component 290 manufactured in accordance with another embodiment of the present invention. Semiconductor component 290 is comprised of a plurality of concentric square-shaped Schottky diode cells or rings C1, C2, C3, C4, C5, C6, C7, C8, and C9, where concentric trenches are formed in the regions identified by reference characters C1-C9. In accordance with the embodiment shown in FIG. 18, multi-concentration doped regions 32A and 82A are formed in the mesa structures between regions C2 and C3 and multi-concentration doped regions 32B and 82B are formed in the mesa structures between regions C6 and C7. It should be noted that the number and spacing of the multi-concentration doped regions is not a limitation of the present invention. For example, the multi-concentration profiles may be formed in the mesa structures between every other concentric trench, every third concentric trench, every fourth concentric trench, every fifth concentric trench, every sixth concentric trench, every eighth concentric trench, etc. That is the multi-concentration doped regions may be formed in every nth concentric trench, where “n” is an integer. FIG. 19 is a cross-sectional view along section line 19-19 of FIG. 18 illustrating the formation of a multi-concentration doping profile in mesa structures 32A and 32H.

For the purpose of illustration and not to limit the scope of the claims, a concentric trench 51A having a floor and sidewalls is formed in a portion C1 of semiconductor material 12; a concentric trench 51B having a floor and sidewalls is formed in a portion C2 of semiconductor material 12; a concentric trench 51C having a floor and sidewalls is formed in a portion C3 of semiconductor material 12; a concentric trench 51D having a floor and sidewalls is formed in a portion C4 of semiconductor material 12; a concentric trench 51E having a floor and sidewalls is formed in a portion C5 of semiconductor material 12; a concentric trench 51F having a floor and sidewalls is formed in a portion C6 of semiconductor material 12; a concentric trench 51G having a floor and sidewalls is formed in a portion C7 of semiconductor material 12; a concentric trench 51H having a floor and sidewalls is formed in a portion C8 of semiconductor material 12; and a concentric trench 51I having a floor and sidewalls is formed in a portion C9 of semiconductor material 12. Trenches 51A-51I are referred to as concentric trenches because concentric trench 51I is surrounded by concentric trench 51H, concentric trench 51H is surrounded by concentric trench 51G, concentric trench 51G is surrounded by concentric trench 51F, concentric trench 51F is surrounded by concentric trench 51E, concentric trench 51E is surrounded by concentric trench 51D, concentric trench 51D is surrounded by concentric trench 51C, concentric trench 51C is surrounded by concentric trench 51B, and concentric trench 51B is surrounded by concentric trench 51A.

A dielectric layer 54A is formed on the floor and sidewalls of concentric trench 51A and an electrically conductive material 64A is formed on dielectric layer 54A; a dielectric layer 54B is formed on the floor and sidewalls of concentric trench 51B and an electrically conductive material 64B is formed on dielectric layer 54B; a dielectric layer 54C is formed on the floor and sidewalls of concentric trench 51C and an electrically conductive material 64C is formed on dielectric layer 54C; a dielectric layer 54D is formed on the floor and sidewalls of concentric trench 51D and an electrically conductive material 64D is formed on dielectric layer 54D; a dielectric layer ME is formed on the floor and sidewalls of concentric trench 51E and an electrically conductive material 64E is formed on dielectric layer 54E; a dielectric layer 54F is formed on the floor and sidewalls of concentric trench 51F and an electrically conductive material 64F is formed on dielectric layer 5FC; a dielectric layer 54G is formed on the floor and sidewalls of concentric trench 51G and an electrically conductive material 64G is formed on dielectric layer 54G; a dielectric layer 54H is formed on the floor and sidewalls of concentric trench 51H and an electrically conductive material 64H is formed on dielectric layer 54H; and a dielectric layer 54I is formed on the floor and sidewalls of concentric trench 51I and an electrically conductive material 64I is formed on dielectric layer 54I.

A concentric Schottky contact region 39A is formed from the portion of semiconductor material 12 between concentric trenches 51A and 51B; a concentric Schottky contact region 39B is formed from the portion of semiconductor material 12 between concentric trenches 51C and 51D; a concentric Schottky contact region 39C is formed from the portion of semiconductor material 12 between concentric trenches 51D and 51E; a concentric Schottky contact region 39D is formed from the portion of semiconductor material 12 between concentric trenches 51E and 51F; a concentric Schottky contact region 39E is formed from the portion of semiconductor material 12 between concentric trenches 51G and 51H; a concentric Schottky contact region 39F is formed from the portion of semiconductor material 12 between concentric trenches 51H and 51I; and a Schottky contact region 39G is formed from the portion of semiconductor material 12 within concentric trench 51I.

Schottky contact portions of contact 94 are formed in contact with Schottky contact regions 39A, 39B, 39C, 39D, 39E, 39F, and 39G. It should be noted that Schottky contact portions may be referred to as conventional Schottky contacts and are not limited to being concentric shaped contacts.

A multi-concentration contact region 37A is formed from the portion of semiconductor material 12 between concentric trenches 51B and 51C and a multi-concentration contact region 37B is formed between concentric trenches 51F and 51G. A multi-concentration contact portion of contact 94 is formed in contact with multi-concentration contact region 37A and a multi-concentration contact portion of contact 94 is formed in contact with multi-concentration contact region 37B.

An Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64A, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64B, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64C, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64D, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64E, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64F, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64G, an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64H, and an Ohmic contact portion of contact 94 is formed in contact with electrically conductive material 64I.

FIG. 20 is a top view of a Schottky device illustrating the frequency of multi-concentration doped regions in accordance with an embodiment of the present invention. What is shown in FIG. 20 is a Schottky device having a multi-concentration profile at a ratio of 2:1, i.e., the ratio represents the number of trenches that do not touch any multi-concentration doped regions. Regions 302 are active mesa regions, regions 304 illustrate regions having trenches, and regions 306 illustrate regions of enhanced doping. Alternatively, the multi-concentration doped region frequency may refer to a percentage of the active region, e.g., a 25% frequency. Thus, in a 2:1 Schottky structure, 25% of the active mesa regions include multi-concentration doped regions.

FIG. 21 is a top view of a Schottky device 300 illustrating the frequency of multi-concentration doped regions in accordance with another embodiment of the present invention. What is shown in FIG. 21 is a Schottky device having a multi-concentration profile at a ratio of 4:1, i.e., the ratio represents the number of trenches that do not touch any multi-concentration doped region. Regions 322 are active mesa regions, regions 324 illustrate regions having trenches, and regions 326 illustrate regions of enhanced doping. Alternatively, the multi-concentration doped region frequency may refer to a percentage of the active region, e.g., a 16.7% frequency. Thus, in a 2:1 Schottky structure, 25% of the active mesa regions include multi-concentration doped regions.

FIG. 22 is a cross-sectional view of a Schottky device 350 in accordance with another embodiment of the present invention. What is shown in FIG. 22 is a semiconductor material 12 having trenches 50A-50N lined with dielectric layers 54A-54N, and containing polysilicon fill material 64A-64N, respectively, as described with reference to FIGS. 1-9. Schottky device 350 differs from Schottky device 10 by the absence of doped regions 32A-32G and 82A-82G. Rather, than the Schottky characteristics being modulated by impurity materials such those of doped regions 32A-32G and 82A-82G, they are controlled by the conductive materials of silicide layers 92, the barrier metal layers, and the conductor 94.

By now it should be appreciated that a semiconductor component such as, for example a Schottky device and methods for manufacturing the semiconductor component have been provided. Manufacturing Schottky devices in accordance with embodiments of the present invention lowers the forward voltage, lowers the leakage current that results from a pinch-off action of the trench-MOS regions, and increases the breakdown voltage of the Schottky devices. The electrical characteristics can be further optimized by forming the doped regions having the multi-concentration impurity profiles, i.e., that include doped regions 32A-32G and doped regions 82A-82F, in one or more mesa structures. For example, a doped region, such as for example a set of doped regions 32A and 82A may be formed in a mesa structure. Alternatively, a set of doped regions such as, for example, doped regions 32A and 82A may be formed in a mesa structure, a set of doped regions such as, for example, doped regions 32B and 82B may be formed in another mesa structure, and yet another a set of doped regions such as, for example, doped regions 32C and 82C may be formed in yet another mesa structure, etc. The number of mesa structures having doped regions with multi-concentration impurity material profiles is not a limitation of the present invention, i.e., there may be one, two, three, or more mesa structures that have doped regions with multi-concentration impurity material profiles.

Formation of doped regions such doped regions 32A-32G and enhanced doped regions such as regions 82A-82G reduce the forward voltage, VF, of a Schottky device because they inject minority carriers during high current levels and modulate the conductivity of the epitaxial layer. The amount of conductivity modulation and the amount of improvement in the forward voltage can be controlled by the dose and frequency of mesa structures having the doped regions, i.e., doped regions 32A-32G and 82A-82G. Another advantage is that the breakdown voltage of the Schottky devices can be improved with minimal impact on the forward voltage and vice versa.

Although certain preferred embodiments and methods have been disclosed herein, it will be apparent from the foregoing disclosure to those skilled in the art that variations and modifications of such embodiments and methods may be made without departing from the spirit and scope of the invention. For example, epitaxial layer 20 may be of P-type conductivity and doped regions 32A-32G and 82A-82G may be of N-type conductivity. It is intended that the invention shall be limited only to the extent required by the appended claims and the rules and principles of applicable law. 

What is claimed is:
 1. A method for manufacturing a Schottky device, comprising: providing a semiconductor material of a first conductivity type having first and second major surfaces; forming a first mesa structure from a first portion of the semiconductor material; forming a first doped region of a second conductivity type and a first impurity material concentration in a first sub-portion of the first mesa structure, the first doped region extending from the first major surface a first distance into the first mesa structure; forming a second doped region of the second conductivity type and a second impurity material concentration in a second sub-portion of the first mesa structure; and forming a Schottky contact to the first mesa structure.
 2. The method of claim 1, further including: forming second and third mesa structures from second and third portions of the semiconductor material, respectively; forming a third doped region of the second conductivity type and a third impurity material concentration in a first sub-portion of the third mesa structure, the first doped region extending from the first major surface a second distance into the third mesa structure; and forming a fourth doped region of the second conductivity type and a fourth impurity material concentration in a second sub-portion of the third mesa structure.
 3. The method of claim 1, further including: forming fourth and fifth mesa structures from fourth and fifth portions of the semiconductor material, respectively; forming a fifth doped region of the second conductivity type and a fifth impurity material concentration in a first sub-portion of the fifth mesa structure, the fifth doped region extending from the first major surface a second distance into the third mesa structure; and forming a sixth doped region of the second conductivity type and a sixth impurity material concentration in a second sub-portion of the sixth mesa structure.
 4. The method of claim 1, wherein forming the second doped region of the second conductivity type and the second impurity material concentration in the second sub-portion of the first mesa structure further includes forming the second doped region to extend from the first major surface a second distance into the first mesa structure, the second distance less than the first distance.
 5. The method of claim 1, wherein the second sub-portion of the first mesa structure is within the first sub-portion of the first mesa structure.
 6. The method of claim 1, wherein forming the first mesa structure comprises forming first and second trenches in the semiconductor material, wherein the first and second trenches extend into the semiconductor material a second distance that is greater than the first distance.
 7. The method of claim 6, further including: forming a first layer of dielectric material in the first trench and a second layer of dielectric material in the second trench; and forming a first polysilicon in the first trench and a second polysilicon in the second trench.
 8. The method of claim 7, wherein forming the second doped region of the second conductivity type comprises: forming a first masking structure over the first semiconductor material, the masking structure having a first opening over the first mesa structure; introducing the first impurity material of the second conductivity type through the first opening into the first mesa structure.
 9. The method of claim 8, wherein introducing the first impurity material of the second conductivity type includes implanting the first impurity material into the first mesa structure.
 10. The method of claim 8, further including: removing the first masking structure; forming a first silicide layer from the first mesa structure; forming a second silicide layer from the second portion of the semiconductor material; and forming a first electrically conductive layer over the first silicide layer and the second silicide layer, the first electrically conductive layer having a first portion that contacts the first silicide layer and a second portion that contacts the second silicide layer, wherein the first silicide layer and the first portion of the first electrically conductive layer form the first multi-concentration contact portion and the second portion of the first electrically conductive layer and the second silicide layer form the Schottky contact.
 11. The method of claim 10, further including: forming a third silicide layer from the first polysilicon in the first trench; forming a fourth silicide layer from the second polysilicon in the second trench; forming the first electrically conductive layer over the third silicide layer and the fourth silicide layer, the first electrically conductive layer having a third portion that contacts the third silicide layer and a fourth portion that contacts the fourth silicide layer, wherein the third portion and the fourth portion of the first electrically conductive layer form an Ohmic contact.
 12. A method for manufacturing a semiconductor material, comprising: providing a semiconductor material of a first conductivity type having first and second major surfaces; forming first, second, and third trenches in the semiconductor material, wherein a first portion of the semiconductor material is between the first and second trenches and a second portion of the semiconductor material is between the second and third trenches; forming a first dielectric material in the first trench, a second dielectric material in the second trench, and a third dielectric material in the third trench; forming a first polysilicon over the first dielectric material in the first trench, a second polysilicon over the first dielectric material in the second trench, and a third polysilicon over the third dielectric material in the third trench; forming a first multi-concentration doped region from the first portion of the semiconductor material; and forming a first silicide layer from the first multi-concentration doped region; forming a second silicide layer from the second portion of the semiconductor material; forming a third silicide layer from the first polysilicon in the first trench; and forming a first electrically conductive layer over the first silicide layer, the second silicide layer, and the third silicide layer, the first electrically conductive layer having a first portion that contacts the first silicide layer, a second portion that contacts the second silicide layer, and a third portion that contacts the third silicide layer wherein the first silicide layer and the first portion of the first electrically conductive layer form a first multi-concentration contact portion that has electrical properties between a conventional Schottky contact and a conventional Ohmic contact without being a conventional Schottky contact or a conventional Ohmic contact, the second portion of the first electrically conductive layer and the second silicide layer form a Schottky contact, and the third portion of the electrically conductive layer form a first Ohmic contact portion.
 13. The method of claim 12, wherein forming the first multi-concentration doped region from the first portion of the semiconductor material comprises: forming a first doped region of the second conductivity type in a first sub-portion of the first portion of the semiconductor material; forming a second doped region of the second conductivity type in a second sub-portion of the first portion of the semiconductor material, the first doped region extending a first distance into the first portion of the semiconductor material and the second doped region extending a second distance into the first portion of the semiconductor material, the first distance greater than the second distance.
 14. The method of claim 13, wherein forming the first multi-concentration doped region comprises: forming a first masking structure over the first semiconductor material, the first masking structure having a first opening over the first portion of the semiconductor material; implanting a first impurity material into the first portion of the semiconductor material through the first opening over the first portion of the semiconductor material to form the first doped region; and implanting additional first impurity material into the first portion of the semiconductor material through the first opening over the semiconductor material to form the second doped region.
 15. The method of claim 12, wherein forming the second doped region of the second conductivity type comprises implanting the first impurity material of the second conductivity type into the semiconductor material using a blanket implant to form a first layer of impurity material, and further including: forming a first masking structure over the first layer of impurity material, the first masking structure having a first opening over the second portion of the semiconductor material, the first opening exposing having a first distance that is less that a distance between the first and second trenches; removing a first portion of the first layer of impurity material that is exposed by the first opening to expose the second portion of the semiconductor material; removing the first masking structure; forming a first silicide layer from the first mesa structure; forming a second silicide layer from the second portion of the semiconductor material; and forming a first electrically conductive layer over the first silicide layer and the second silicide layer, the first electrically conductive layer having a first portion that contacts the first silicide layer and a second portion that contacts the second silicide layer, wherein the first silicide layer and the first portion of the first electrically conductive layer form the first multi-concentration contact portion and the second portion of the first electrically conductive layer and the second silicide layer form the Schottky contact.
 16. The method of claim 15, wherein forming the second doped region includes forming the second doped region to extend further into the semiconductor material from the first major surface than the first and second trenches extend into the semiconductor material from the first major surface. 